DocumentCode :
2266381
Title :
Gallium-diffused ridge waveguides in sapphire
Author :
Apostolopoulos, V. ; Sager, D.A. ; Wilkinson, J.S. ; Hickey, L.M.B.
Author_Institution :
Optoelectron. Res. Centre, Southampton Univ., UK
fYear :
2002
fDate :
24-24 May 2002
Firstpage :
251
Abstract :
Summary form only given. It has been shown that Ga:sapphire channel waveguides with small mode sizes may be realized by diffusion and ion-beam milling. Co-doping of sapphire with titanium and gallium is expected to lead to waveguide lasers with improved performance, as the gallium-diffused waveguide yields a small mode size for low pump power threshold and the titanium concentration may be flexibly adjusted for optimum laser operation. The realization of a passive waveguide technology in sapphire is also expected to allow the integration of passive devices for wavelength selection and tuning gain sections locally doped with titanium.
Keywords :
diffusion; gallium; integrated optics; optical fabrication; optical waveguides; ridge waveguides; sapphire; titanium; waveguide lasers; Al/sub 2/O/sub 3/:Ga; Al/sub 2/O/sub 3/:Ga,Ti; Ga:sapphire channel waveguides; co-doping; diffusion; gallium-diffused ridge waveguides; integration; ion-beam milling; low pump power threshold; optimum laser operation; passive waveguide technology; sapphire; small mode size; small mode sizes; tuning gain sections; waveguide lasers; wavelength selection; Glass; Optical device fabrication; Optical planar waveguides; Optical waveguides; Optimized production technology; Planar waveguides; Refractive index; Titanium; Waveguide lasers; Waveguide transitions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
Type :
conf
DOI :
10.1109/CLEO.2002.1033910
Filename :
1033910
Link To Document :
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