Title :
Contamination control of a corona discharge air ionizer
Author :
Takeuchi, Masaru ; Terashige, T. ; Tsuruta, N. ; Okano, Kunihisa
Author_Institution :
Ibaraki Univ., Hitachi, Japan
fDate :
30 Sept.-2 Oct. 2003
Abstract :
A corona discharge air ionizer is one of the most useful equipment to control electrostatic charges on ULSI in the manufacturing processes. However, a conventional air ionizer generates various kinds of contamination. The dual jet air ionizer that has a jet emitter in a nozzle was proposed to reduce the contamination from an air ionizer. The ozone generation, the particle generation, and the cluster-like material growth to the emitter tip were investigated for the dual jet air ionizer as a function of the jet flow rates out of the emitter and the nozzle. These contamination generated from the dual jet air ionizer depended strongly on the flow rates and were lower than that from a conventional air ionizer. These contamination characteristics of the dual jet air ionizer were compared with a conventional air ionizer.
Keywords :
ULSI; contamination; corona; discharges (electric); integrated circuit manufacture; nozzles; plasma jets; production equipment; ULSI; cluster-like material growth; contamination control; corona discharge; dual jet air ionizer; electrostatic charges; jet emitter; jet flow; nozzle; ozone generation; particle generation; Contamination; Corona; Electrostatic discharge; Manufacturing processes; Nitrogen; Production; Semiconductor devices; Silicon; Spraying; Ultra large scale integration;
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
Print_ISBN :
0-7803-7894-6
DOI :
10.1109/ISSM.2003.1243332
