Title :
Examination of high frequency dielectric properties of thin film polymers using an in-situ resonant technique
Author :
Laursen, Kirk G. ; Hertling, David ; Hodge, Thomas C. ; Bidstrup, Sue Ann ; Kohl, Paul A.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
31 Jan-2 Feb 1995
Abstract :
Using an on-wafer resonant technique the high frequency dielectric properties of six thin film polymers are measured in the range from 1 GHz to 9 GHz. Comparisons are made between the high frequency and low frequency values of the dielectric constant. The effects of different cure conditions and metallizations are also examined
Keywords :
UHF measurement; dielectric resonance; insulating thin films; microwave measurement; multichip modules; permittivity measurement; polymer films; resonance; 1 to 9 GHz; HF dielectric properties; SHF; UHF; cure conditions; dielectric constant; high frequency range; in-situ resonant technique; metallizations; onwafer resonant technique; thin film polymers; Capacitors; Dielectric constant; Dielectric measurements; Dielectric substrates; Dielectric thin films; Dielectrics and electrical insulation; Frequency measurement; Polymer films; Resonance; Resonant frequency;
Conference_Titel :
Multi-Chip Module Conference, 1995. MCMC-95, Proceedings., 1995 IEEE
Conference_Location :
Santa Cruz, CA
Print_ISBN :
0-8186-6970-5
DOI :
10.1109/MCMC.1995.512032
