• DocumentCode
    2267681
  • Title

    Chromium plating pollution source reduction by plasma source ion implantation

  • Author

    An Chen ; Qiu, X. ; Sridharan, K. ; Horne, W.G. ; Dodd, R.A. ; Hamdi, A.H. ; Elmoursi, A.A. ; Malaczynski, G.W. ; Conrad, J.R.

  • Author_Institution
    Dept. of Nucl. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    115
  • Abstract
    Summary form only given, as follows. There is growing concern over the environmental toxicity and workers´ health issues due to the chemical baths and rinse water used in the hard chromium plating process. In this regard the significant hardening response of chromium to nitrogen ion implantation can be environmentally beneficial from the standpoint of decreasing the thickness and the frequency of application of chromium plating. In this paper the results of a study of nitrogen ion implantation of chrome plated test flats using the non-line-of-sight Plasma Source Ion Implantation (PSII) process, are discussed. Surface characterization was performed using Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES), and Electron Spectroscopy for Chemical Analysis (ESCA). The surface properties were evaluated using a microhardness tester, a pin-on-disk wear tester, and a corrosion measurement system. Industrial field testing of nitrogen PSII treated chromium plated parts showed an improvement by a factor of two compared to the unimplanted case.
  • Keywords
    Auger effect; chromium; electron spectroscopy; ion implantation; nitrogen; plasma deposition; scanning electron microscopy; spectrochemical analysis; surface hardening; Auger electron spectroscopy; Cr; Cr plating pollution source reduction; N ion implantation; N/sub 2/; chemical baths; chrome plated test flats; corrosion measurement system; electron spectroscopy for chemical analysis; environmental toxicity; field testing; hard chromium plating process; microhardness tester; nonline-of-sight process; pin-on-disk wear tester; plasma source ion implantation; plated parts; rinse water; scanning electron microscopy; surface characterization; workers´ health issues; Chemical processes; Chromium; Ion implantation; Nitrogen; Plasma sources; Pollution; Scanning electron microscopy; Spectroscopy; Surface treatment; System testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531472
  • Filename
    531472