DocumentCode
2267681
Title
Chromium plating pollution source reduction by plasma source ion implantation
Author
An Chen ; Qiu, X. ; Sridharan, K. ; Horne, W.G. ; Dodd, R.A. ; Hamdi, A.H. ; Elmoursi, A.A. ; Malaczynski, G.W. ; Conrad, J.R.
Author_Institution
Dept. of Nucl. Eng., Wisconsin Univ., Madison, WI, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
115
Abstract
Summary form only given, as follows. There is growing concern over the environmental toxicity and workers´ health issues due to the chemical baths and rinse water used in the hard chromium plating process. In this regard the significant hardening response of chromium to nitrogen ion implantation can be environmentally beneficial from the standpoint of decreasing the thickness and the frequency of application of chromium plating. In this paper the results of a study of nitrogen ion implantation of chrome plated test flats using the non-line-of-sight Plasma Source Ion Implantation (PSII) process, are discussed. Surface characterization was performed using Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES), and Electron Spectroscopy for Chemical Analysis (ESCA). The surface properties were evaluated using a microhardness tester, a pin-on-disk wear tester, and a corrosion measurement system. Industrial field testing of nitrogen PSII treated chromium plated parts showed an improvement by a factor of two compared to the unimplanted case.
Keywords
Auger effect; chromium; electron spectroscopy; ion implantation; nitrogen; plasma deposition; scanning electron microscopy; spectrochemical analysis; surface hardening; Auger electron spectroscopy; Cr; Cr plating pollution source reduction; N ion implantation; N/sub 2/; chemical baths; chrome plated test flats; corrosion measurement system; electron spectroscopy for chemical analysis; environmental toxicity; field testing; hard chromium plating process; microhardness tester; nonline-of-sight process; pin-on-disk wear tester; plasma source ion implantation; plated parts; rinse water; scanning electron microscopy; surface characterization; workers´ health issues; Chemical processes; Chromium; Ion implantation; Nitrogen; Plasma sources; Pollution; Scanning electron microscopy; Spectroscopy; Surface treatment; System testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531472
Filename
531472
Link To Document