Status of plasma source developments for ion beam and PIII applications at INRS-Energie et Materiaux

Summary form only given, as follows. The development of fast modulated plasma sources for use with energetic ion beam and plasma immersed ion implantation (PIII) systems is in progress at INRS-Energie et Materiaux. DuoPIGatron and compact ECR sources are both under development. Modulation of the duoPIGatron source has been realized using a fast switching circuit. The useful modulation frequency is limited by the source impedance. The ECR plasma sources are modulated via pulsing the 2.45 GHz, 1.5 kW microwave power. Two types of ECR plasma sources are under study. The first is a volume resonance source, which has been operational for several years. The other source is a new surface resonance source, where 28 columns of NdFeB permanent magnets arranged with alternating poles provide both the resonance surface and the confining field for the plasma electrons. Various diagnostics such as scanning Langmuir probes and diamagnetic loops are used for characterization of the source plasma. Laser fluorescence spectroscopy provides the main diagnostic tool for studying the ion energy distribution in the plasma sheath region. The optimization of plasma sources, the setup for PIII studies and the results will be presented and discussed.