• DocumentCode
    2268821
  • Title

    High voltage SJ-pLDMOS with Variation Lateral Doping drift layer

  • Author

    Luo, Bo ; Qiao, Ming ; Wang, Yongchun ; Kou, Mingliang ; Ye, Jun ; Zhang, Bo ; Li, Zhaoji

  • Author_Institution
    State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • fYear
    2010
  • fDate
    28-30 July 2010
  • Firstpage
    503
  • Lastpage
    506
  • Abstract
    This paper reports a novel Super Junction pLDMOS (SJ-pLDMOS) with charge-balanced SJ region at the surface of Variation Lateral Doping (VLD) drift region. SJ region provides a low on-resistance path in the ON-state and keeps charge balance approximately when the doping concentration of p pillars is slightly higher than that of the n pillars during the OFF-state. A significant reduction of the specific on-resistance for a given Breakdown Voltage (BV) can be achieved by using a high aspect ratio of the SJ pillars. Simulation results show that the SJ-pLDMOS with Ld of 35μm exhibits BV of 582V and Ron,SP of 210mΩ.cm2, yielding to a power Figure Of Merit (FOM) of 1.6 MW/cm2. These excellent device performances make the proposed SJ-pLDMOS a promising candidate for level shift circuit.
  • Keywords
    power MOSFET; semiconductor device breakdown; semiconductor doping; breakdown voltage; level shift circuit; super junction pLDMOS; variation lateral doping drift layer; variation lateral doping drift region; voltage 582 V; Electric breakdown; Junctions; Logic gates; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications, Circuits and Systems (ICCCAS), 2010 International Conference on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-8224-5
  • Type

    conf

  • DOI
    10.1109/ICCCAS.2010.5581945
  • Filename
    5581945