Title :
High voltage SJ-pLDMOS with Variation Lateral Doping drift layer
Author :
Luo, Bo ; Qiao, Ming ; Wang, Yongchun ; Kou, Mingliang ; Ye, Jun ; Zhang, Bo ; Li, Zhaoji
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
This paper reports a novel Super Junction pLDMOS (SJ-pLDMOS) with charge-balanced SJ region at the surface of Variation Lateral Doping (VLD) drift region. SJ region provides a low on-resistance path in the ON-state and keeps charge balance approximately when the doping concentration of p pillars is slightly higher than that of the n pillars during the OFF-state. A significant reduction of the specific on-resistance for a given Breakdown Voltage (BV) can be achieved by using a high aspect ratio of the SJ pillars. Simulation results show that the SJ-pLDMOS with Ld of 35μm exhibits BV of 582V and Ron,SP of 210mΩ.cm2, yielding to a power Figure Of Merit (FOM) of 1.6 MW/cm2. These excellent device performances make the proposed SJ-pLDMOS a promising candidate for level shift circuit.
Keywords :
power MOSFET; semiconductor device breakdown; semiconductor doping; breakdown voltage; level shift circuit; super junction pLDMOS; variation lateral doping drift layer; variation lateral doping drift region; voltage 582 V; Electric breakdown; Junctions; Logic gates; Substrates;
Conference_Titel :
Communications, Circuits and Systems (ICCCAS), 2010 International Conference on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-8224-5
DOI :
10.1109/ICCCAS.2010.5581945