Title :
Resonantly enhanced near-field lithography
Author :
Tsang, Mankei ; Psaltis, Demetri
Author_Institution :
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA
Abstract :
We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator.
Keywords :
lenses; optical fabrication; optical resonators; photolithography; Bessel resonance modes; planar optical resonator; resonantly enhanced noncontact near-field lithography; solid immersion lens; subwavelength small spots; Dielectric losses; Lenses; Lithography; Optical imaging; Optical resonators; Optical surface waves; Photonic crystals; Resists; Resonance; Solids; (110.4235) Nanolithography; (230.5750) Resonators;
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
