DocumentCode :
2269222
Title :
Transient impact ionization in bulk Si [MOS devices]
Author :
Iizuka, Takahiro ; Kato, Haruo
Author_Institution :
Microelectron. Res. Labs., NEC Corp., Kanagawa, Japan
fYear :
1994
fDate :
5-6 Jun 1994
Firstpage :
59
Lastpage :
62
Abstract :
The generation rate, Gii, due to impact ionization and the impact ionization coefficient α in bulk Si are calculated from carrier distribution functions, solving the k-space Boltzmann transport equation. Gii and α are dependent on transients, and are not universal with respect to average energy, which facts originate in the different structures in k-space distribution function even at the same average energy. In such cases, the conventional relation of αJ (where J is the current density) fails to predict Gii, so far as one takes α for the steady-state α w defined as a function of average energy
Keywords :
Boltzmann equation; MIS devices; carrier density; elemental semiconductors; hot carriers; impact ionisation; silicon; transient analysis; MOS devices; Si-SiO2; average energy; bulk Si; carrier distribution functions; current density; generation rate; hot carriers; k-space Boltzmann transport equation; transient impact ionization; Distribution functions; Electron mobility; Hot carriers; Impact ionization; MOS devices; Microelectronics; Nonuniform electric fields; Occupational stress; Scattering; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1994. NUPAD V., International Workshop on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-1867-6
Type :
conf
DOI :
10.1109/NUPAD.1994.343491
Filename :
343491
Link To Document :
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