DocumentCode :
2269362
Title :
Experimental measurement of the impressed electric field in a multipolar electron cyclotron resonance plasma source
Author :
Mak, P. ; Asmussen, J.
Author_Institution :
Dept. of Electr. Eng., Michigan State Univ., East Lansing, MI, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
131
Abstract :
Summary form only given. It is well-known that microwave sources exhibit complex, nonlinear output behavior versus many independent input variables. For example, the output plasma density can vary by over an order of magnitude as the independent input variables, such as microwave power, pressure, gas flow rate and microwave reactor matching are only slightly changed. In addition, these output variations exhibit hysteresis and multiple steady-states, which are dependent in poorly-understood ways upon the many different independently controllable input variables. An understanding of this nonlinear input/output behavior is essential for optimum plasma source design and also is required for developing automatic reactor control strategies. Thus this paper will describe the detailed experimental measurement of the relationships between the input variables, the internal variables and the output variables; of a multipolar electron cyclotron resonance (ECR) plasma source. The experimental performance of a 12.5 cm diameter, 2.45 GHz excited multipolar ECR plasma source is measured in argon gas.
Keywords :
electric fields; plasma density; plasma production; 0.8 to 8 mtorr; 2.45 GHz; 200 to 350 W; Ar; Ar gas; automatic reactor control strategies; electric field; gas flow rate; hysteresis; input variables; internal variables; microwave power; microwave reactor; multiple steady-states; multipolar electron cyclotron resonance plasma source; nonlinear input/output behavior; optimum plasma source design; output variables; plasma density; pressure; Automatic control; Electric variables measurement; Fluid flow; Hysteresis; Inductors; Input variables; Plasma density; Plasma measurements; Plasma sources; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.531551
Filename :
531551
Link To Document :
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