• DocumentCode
    2269389
  • Title

    A freely localized discharge excited by intense microwave beams in high-pressure gases. Physics and applications

  • Author

    Vikharev, A.L. ; Gorbachev, A.M.

  • Author_Institution
    Inst. of Appl. Phys., Acad. of Sci., Nizhny Novgorod, Russia
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    131
  • Abstract
    Summary form only given. In the paper the recent successes of IAP microwave discharge group in studies of a discharge excited by intense converging microwave beams in high-pressure gases are presented. This discharge as a source of nonequilibrium freely localized plasma is very promising for a lot of applications in industry such as surface treatment, thin film deposition and super-pure plasma chemistry. The discharge gives a high density of active neutral species needed for these applications. But its successful application depends on the understanding of the physical processes which define dynamics, complicated discharge structure and plasma parameters. In the experiments the microwaves of wavelength 8-mm, pulse power 400 kW, pulse duration 50-500 microsecond, pulses repetition frequency 0.1-10 Hz are used. The main discharge properties in different gases at pressure 100-760 Torr are investigated.
  • Keywords
    high-frequency discharges; high-pressure effects; plasma electromagnetic wave propagation; plasma pressure; plasma production; 0.1 to 10 Hz; 100 to 760 torr; 400 kW; freely localized discharge; high-pressure gases; intense microwave beams; microwave discharge; nonequilibrium freely localized plasma source; plasma parameters; super-pure plasma chemistry; surface treatment; thin film deposition; Fault location; Gases; Plasma applications; Plasma chemistry; Plasma density; Plasma properties; Plasma sources; Sputtering; Surface discharges; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531552
  • Filename
    531552