DocumentCode :
2269588
Title :
A comparison of supervisory control algorithms for tool/process disturbance tracking
Author :
Braun, M.W. ; Jenkins, S.T. ; Patel, N.S.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
3
fYear :
2003
fDate :
4-6 June 2003
Firstpage :
2626
Abstract :
The performance of four supervisory algorithms: segregated exponentially weighted moving average, exponentially weighted moving average, adaptive exponentially weighted moving average, and recursive least squares, are compared in Monte-Carlo simulation of an example system dataset, as well as on real industrial data from a photolithography process. Advantages and disadvantages of the algorithms are compared with specific focus on practical issues of interest to the user.
Keywords :
Monte Carlo methods; least mean squares methods; moving average processes; photolithography; process control; recursive estimation; semiconductor device manufacture; Monte Carlo simulation; adaptive exponentially weighted moving average; photolithography process; process disturbance tracking; recursive least squares; segregated exponentially weighted moving average; supervisory control; system dataset; tool disturbance tracking; Conductors; Electrical equipment industry; Filtering algorithms; Instruments; Integrated circuit modeling; Least squares methods; Lithography; Profitability; Signal processing algorithms; Supervisory control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 2003. Proceedings of the 2003
ISSN :
0743-1619
Print_ISBN :
0-7803-7896-2
Type :
conf
DOI :
10.1109/ACC.2003.1243473
Filename :
1243473
Link To Document :
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