Title :
Comparison of plasma sources for surface treatment applications: Radiofrequency inductively coupled and surface-wave microwave plasma sources
Author :
Laurent, C. ; Lo, Julia ; Caillier, Bruno ; Therese, Laurent ; Guillot, Phillipe
Author_Institution :
CUFR J. F. Champollion, Univ. de Toulouse, Albi, France
Abstract :
Summary form only given. This work was conducted within the framework of PAUD (Plasma Airborne molecular contamination Ultra Desorption), a collaborative program funded by OSEO and certified by French global competitive clusters Minalogic and Trimatec. The main object of interest is to develop new technology bricks for next generation molecular decontamination systems. As part of our research effort in evaluating the potential of plasma treatment as a solution, the performance of different plasma sources was evaluated.Here, we will show the electronic density and temperature radial profiles, as well as plasma emission at different locations obtained with both plasma sources. The results will be presented as a function of sources injected power (up to 2 kW), argon gas flow (10 ~ 300 sccm) and pressure (5 10-3 ~5 10-1 mbar).
Keywords :
electron density; plasma density; plasma materials processing; plasma sources; plasma temperature; plasma waves; surface treatment; electronic density radial profiles; electronic temperature radial profiles; next generation molecular decontamination systems; plasma airborne molecular contamination ultradesorption; plasma emission; plasma treatment; radiofrequency inductively coupled plasma sources; surface treatment applications; surface-wave microwave plasma sources; Argon; Optical surface waves; Plasma sources; Radio frequency; Surface contamination; Surface treatment;
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
DOI :
10.1109/PLASMA.2014.7012194
