Title :
Fitting System Based on Base-Etation and Fitting Software for Fully Implantable Middle Hearing Device
Author :
Lee, Jang-Woo ; Jung, Eui-Sung ; Lim, Hyung-Gyu ; Lee, Myoung-Won ; Kim, Dong-Wook ; Kim, Min-Woo ; Seong, Ki-Woong ; Woo, Sang-Hyo ; Lee, Jyung-Hyun ; Cho, Jin-Ho
Author_Institution :
Grad. Sch. of Electr. Eng. & Comput. Sci., Kyungpook Nat. Univ., Daegu
Abstract :
We announced that fully implantable middle ear hearing device (F-IMEHD) has been researched in several papers. The F-IMEHD requires proper fitting process reflected properties of each device like other hearing aids. The F-IMEHD uses vibration transducer attached on ossicles for a sound transmission to human´s inner ear. The F-IMEHD is implanted under the skin. Therefore, the fitting process for F-IMEHD has to consider properties of the microphone and transducer. In this paper, fitting system which consist of basestation and fitting software, have been designed and implemented for fitting and control of F-IMEHD. We calculate proper parameters according to hearing threshold level of each patient using the fitting software, and the parameters are transmitted to implanted system from the base-station. The base-station has all control function for F-IMEHD using a wireless communication. Moreover the base-station is a relay station which fitting parameters send to implanted system from fitting software on a PC.
Keywords :
biomedical communication; biomedical transducers; ear; hearing aids; radiocommunication; F-IMEHD fitting system; base station; fully-implantable middle hearing device; hearing aids; hearing threshold level; human inner ear; implantable microphone; ossicles; relay station; sound transmission; vibration transducer; wireless communication; Acoustic transducers; Auditory system; Communication system control; Control systems; Ear; Hearing aids; Microphones; Skin; Software design; Wireless communication; fitting system; fully implantable middle ear hearing device;
Conference_Titel :
Intelligent Information Technology Application, 2008. IITA '08. Second International Symposium on
Conference_Location :
Shanghai
Print_ISBN :
978-0-7695-3497-8
DOI :
10.1109/IITA.2008.496