Two-photon polymerization with femtosecond pulses and fabrication of microoptical devices and photonic structures

Author

Serbin, J. ; Fallnich, C. ; Chichkov, B.N.

Author_Institution

Laser Zentrum Hannover e.V., Germany

fYear

2002

fDate

24-24 May 2002

Abstract

Summary form only given. Investigations of a two photon polymerization technique and its potential for the fabrication of low-loss, high-performance microoptical devices will be discussed. The resins we use are designed for ultraviolet photolithography and contain photo-initiators sensitive to 390 nm radiation. These resins are exposed to tightly focused 80-fs Ti:sapphire laser pulses initiating two-photon polymerization in small focal volume.

Keywords

high-speed optical techniques; laser beam effects; micro-optics; optical fabrication; optical focusing; optical losses; optical polymers; polymerisation; two-photon processes; 390 nm; 80 fs; Al/sub 2/O/sub 3/:Ti; Ti:sapphire laser pulses; high-performance microoptical devices; incident laser light; liquid resin; low-loss; photo-initiators; photolithography; small focal volume; two-photon polymerization technique; Laser beams; Nonlinear optics; Optical device fabrication; Optical losses; Optical polymers; Optical pulses; Optical refraction; Optical waveguides; Resins; Ultrafast optics;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Long Beach, CA, USA

Print_ISBN

1-55752-706-7

Type

conf

DOI

10.1109/CLEO.2002.1034240

Filename

1034240