DocumentCode :
22738
Title :
Microfabrication of a high-density, non-neutral antimatter trap
Author :
Narimannezhad, Alireza ; Jennings, Joshah ; Weber, Marc H. ; Lynn, Kelvin G.
Author_Institution :
Center for Mater. Res., Washington State Univ., Pullman, WA, USA
Volume :
9
Issue :
10
fYear :
2014
fDate :
10 2014
Firstpage :
630
Lastpage :
634
Abstract :
A unique approach for the fabrication of long-aspect ratio microtubes is presented for an antimatter trap. Conventionally, non-neutral antimatter is stored using a Penning-Malmberg trap, a single tube with aspect ratios being of the order of less than 10:1. Parallel microtubes with aspect ratios of 1000:1 have the potential to store many orders of magnitude more. The silicon industry has paved the way to microelectromechanical systems technologies which have been utilised in this research. Standard processes such as photolithography, deep reactive ion etching, sputtering and thermo-compression bonding were all used; however, unique methods of these processes were developed to overcome many engineering challenges and realise successful trapping.
Keywords :
antimatter; microfabrication; micromechanical devices; particle traps; photolithography; sputter etching; Penning-Malmberg trap; deep reactive ion etching; high-density nonneutral antimatter trap; long-aspect ratio microtubes; microelectromechanical system technologies; microfabrication; photolithography; silicon industry; sputtering; thermocompression bonding;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2014.0239
Filename :
6942311
Link To Document :
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