Title :
Fractal study of the sputtered contact surface relief
Author :
Moos, Evgeny N. ; Borisovskiy, Petr A.
Author_Institution :
Ryazan State Univ. named for S.A. Yesenin, Ryazan, Russia
fDate :
June 30 2014-July 4 2014
Abstract :
The ion-plasma treatment technology for the contact is important one on new stage development [1]. The fractal dimension of the contact surface after this undergoing were studied by atomic force microscopy (AFM). The influence on the power value change in the morphology of the surface relief are shown.
Keywords :
atomic force microscopy; fractals; ion beam applications; plasma materials processing; sputtering; surface morphology; AFM; atomic force microscopy; fractal dimension; ion-plasma treatment technology; power value change; sputtered contact surface relief; surface relief morphology; Discharges (electric); Fractals; Surface discharges; Surface morphology; Surface topography; Surface treatment; Three-dimensional displays;
Conference_Titel :
Vacuum Electron Sources Conference (IVESC), 2014 Tenth International
Conference_Location :
St. Petersburg
Print_ISBN :
978-1-4799-5770-5
DOI :
10.1109/IVESC.2014.6892035
