• DocumentCode
    2273952
  • Title

    Development of Ultra-Miniaturized Piezoresistive Pressure Sensors for Biomedical Applications

  • Author

    Gowrishetty, Usha ; Walsh, Kevin ; Aebersold, Julia ; Jackson, Douglas ; Millar, Huntly ; Roussel, Tommy

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY
  • fYear
    2008
  • fDate
    13-16 July 2008
  • Firstpage
    89
  • Lastpage
    92
  • Abstract
    Ultra miniaturized 0.69-French piezoresistive pressure transducers are designed and fabricated for biomedical applications. Silicon on insulator (SOI) and deep reactive ion etching (DRIE) technologies are used for the fabrication of the pressure sensors. A combination of SOI and DRIE technologies eliminates the dicing step and results in uniform diaphragm thickness. The dimensions of the final fabricated sensor die are 650 mum times 230 mum times 150 mum (length, width, thickness) with 2.5 mum thick diaphragms. Sensitivity of the sensors with half Wheatstone bridge configuration is determined to be 27-31 muV/V/mmHg.
  • Keywords
    biomedical transducers; piezoresistive devices; pressure sensors; Wheatstone bridge configuration; biomedical applications; deep reactive ion etching; silicon on insulator; ultra miniaturized piezoresistive pressure sensors; Biomedical engineering; Biomedical monitoring; Biosensors; Catheters; Fabrication; Immune system; Piezoresistance; Silicon on insulator technology; Sputtering; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
  • Conference_Location
    Louisville, KY
  • Print_ISBN
    978-1-4244-2484-9
  • Electronic_ISBN
    978-1-4244-2485-6
  • Type

    conf

  • DOI
    10.1109/UGIM.2008.30
  • Filename
    4573208