DocumentCode :
2273952
Title :
Development of Ultra-Miniaturized Piezoresistive Pressure Sensors for Biomedical Applications
Author :
Gowrishetty, Usha ; Walsh, Kevin ; Aebersold, Julia ; Jackson, Douglas ; Millar, Huntly ; Roussel, Tommy
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY
fYear :
2008
fDate :
13-16 July 2008
Firstpage :
89
Lastpage :
92
Abstract :
Ultra miniaturized 0.69-French piezoresistive pressure transducers are designed and fabricated for biomedical applications. Silicon on insulator (SOI) and deep reactive ion etching (DRIE) technologies are used for the fabrication of the pressure sensors. A combination of SOI and DRIE technologies eliminates the dicing step and results in uniform diaphragm thickness. The dimensions of the final fabricated sensor die are 650 mum times 230 mum times 150 mum (length, width, thickness) with 2.5 mum thick diaphragms. Sensitivity of the sensors with half Wheatstone bridge configuration is determined to be 27-31 muV/V/mmHg.
Keywords :
biomedical transducers; piezoresistive devices; pressure sensors; Wheatstone bridge configuration; biomedical applications; deep reactive ion etching; silicon on insulator; ultra miniaturized piezoresistive pressure sensors; Biomedical engineering; Biomedical monitoring; Biosensors; Catheters; Fabrication; Immune system; Piezoresistance; Silicon on insulator technology; Sputtering; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location :
Louisville, KY
Print_ISBN :
978-1-4244-2484-9
Electronic_ISBN :
978-1-4244-2485-6
Type :
conf
DOI :
10.1109/UGIM.2008.30
Filename :
4573208
Link To Document :
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