Abstract :
The following topics are dealt with: doping technology; annealing technology; shallow junction compound semiconductors; junction technology; modeling and simulation; silicide technology; contact technology; and CMOS device structures junction technology.
Keywords :
CMOS integrated circuits; annealing; electrical contacts; semiconductor devices; semiconductor doping; semiconductor junctions; CMOS device structures junction technology; annealing technology; compound semiconductors junction technology; contact technology; doping technology; modeling and simulation; shallow junction; silicide technology;
Conference_Titel :
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4673-1258-5
Electronic_ISBN :
978-1-4673-1256-1
DOI :
10.1109/IWJT.2012.6212791
