DocumentCode :
2274162
Title :
Foreword
Author :
Yu-Long Jiang ; Shishiguchi, Seiichi ; Ohuchi, Kazuya ; Wakabayashi, Hitoshi ; Deleonibus, Simon ; Yee-Chia Yeo ; Shu Qin
Author_Institution :
Fudan University, China
fYear :
2012
fDate :
14-15 May 2012
Firstpage :
1
Lastpage :
1
Abstract :
The 12th International Workshop on Junction Technology (IWJT-2012) is scheduled to be held on May 14-15, 2012 in Shanghai, China. Thanks to the great support of the engineers and scientists in this field, the workshop has been recognized in the world as one of the key technical meetings in the field of junction technology and has been referenced in numbers of papers. The IWJT-2012 has accepted 57 invited and contributed papers for oral presentation. The authors come from Mainland China and other countries and regions of America, Asia and Europe.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location :
Shanghai, China
Print_ISBN :
978-1-4673-1258-5
Electronic_ISBN :
978-1-4673-1256-1
Type :
conf
DOI :
10.1109/IWJT.2012.6212795
Filename :
6212795
Link To Document :
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