Title :
Observation of Both Potential Barrier-Type and Conductive-Bridge-Type Resistance Switching with LiNbO3 Thin Films
Author_Institution :
NTT Microsystem Integration Lab., Atsugi
Abstract :
Electric transport in sputtered LiNbO3 (LN) films sandwiched between TiN and Si electrodes revealed Schottky emission at low electric field and Poole-Frenkel conduction at higher electric field without any hysteresis. The Poole-Frenkel conduction region was brought into the reproducible potential barrier-controlled conduction region by inserting a thin SiO2 layer between LN and TiN, where current hysteresis appeared. Trapping of electrons at SiO2/LN interface states when TiN is negatively biased produces the highest potential barrier, resulting in a high resistance state, whereas releasing the trapped electrons at positive bias leads to a low resistant state. When electric contact to the TiN electrode was taken using Ag paste, another current hysteresis resulting from the connection and disconnection of Ag filaments was observed after time-dependent soft dielectric breakdown.
Keywords :
Poole-Frenkel effect; Schottky effect; dielectric hysteresis; electric breakdown; electrical contacts; electron traps; ferroelectric switching; ferroelectric thin films; interface states; lithium compounds; silicon; silicon compounds; titanium compounds; Poole-Frenkel conduction; Schottky emission; TiN-LiNbO3-Si-SiO2; current hysteresis; dielectric breakdown; electric contact; electric transport; electron trapping; interface states; potential barrier; potential barrier-controlled conduction region; resistance switching; thin films; Electric resistance; Electrodes; Electron traps; Ferroelectric materials; Hysteresis; Schottky diodes; Semiconductor films; Sputtering; Substrates; Tin;
Conference_Titel :
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location :
Nara
Print_ISBN :
978-1-4244-1334-8
Electronic_ISBN :
1099-4734
DOI :
10.1109/ISAF.2007.4393164