DocumentCode :
2275155
Title :
Explicit approximation of surface potential for fully-depleted polysilicon thin-film transistors
Author :
Ma, Xiaoyu ; Deng, Wanling ; Huang, Lunkai
Author_Institution :
Dept. of Electron. Eng., Jinan Univ., Guangzhou, China
fYear :
2012
fDate :
14-15 May 2012
Firstpage :
164
Lastpage :
167
Abstract :
A physical-based and explicit calculation of surface potential for fully-depleted polysilicon thin-film transistors is proposed in this paper. For fully-depleted devices, not only the surface potential in the channel, but also the potential at the back surface are solved analytically. An exponential density of defect states is taken into account. The proposed scheme to calculate the surface potential at both interfaces is derived by using the Lambert W function, which greatly improves computational efficiency and is critical in circuit simulation. The effects of trap state density and film thickness on surface potential was discussed. It is verified that the proposed scheme accurately reproduces the numerical results.
Keywords :
approximation theory; circuit simulation; defect states; elemental semiconductors; semiconductor thin films; silicon; surface potential; thin film transistors; Lambert function; Si; circuit simulation; computational efficiency; defect states; explicit approximation; film thickness; fully-depleted devices; fully-depleted polysilicon thin-film transistors; physical-based calculation; state density; surface potential; Abstracts; Films; Insulators; Logic gates; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4673-1258-5
Electronic_ISBN :
978-1-4673-1256-1
Type :
conf
DOI :
10.1109/IWJT.2012.6212834
Filename :
6212834
Link To Document :
بازگشت