Effects of Rapid Thermal Annealing on Nucleation and Growth Behavior of Lead Zirconate Titanate Films

Author

Lu, Jian ; Zhang, Yi ; Ikehara, Tsuyoshi ; Mihara, Takashi ; Maeda, Ryutaro

Author_Institution

Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Ibaraki

fYear

2007

fDate

27-31 May 2007

Firstpage

83

Lastpage

86

Abstract

This paper investigated the effects of rapid thermal annealing (RTA) on nucleation and growth behavior of sol-gel derived lead zirconate titanate (PZT) films. The effects of RTA on films´ surface morphology, residual stress and orientation were also studied. It was found that residual stress of the film can be effectively reduced by extending the RTA time. High heating-rate was preferred for uniform PZT film nucleation and grain-growth, which resulted in dense microstructures and smooth film surface. Low heating-rate lead to strong PZT (100) orientation and low residual stress, but at the risk of film-crack caused by arbitrarily distributed large crystallites of about 300 nm in diameter among those with diameter of ~30 nm.

Keywords

crystal orientation; crystallites; ferroelectric ceramics; lead compounds; nucleation; rapid thermal annealing; sol-gel processing; zirconium compounds; PZT; crystallites; film surface; growth behavior; lead zirconate titanate films; microstructures; nucleation; orientation; rapid thermal annealing; residual stress; sol-gel processing; Atomic force microscopy; Crystallization; Electrodes; Microstructure; Piezoelectric films; Rapid thermal annealing; Residual stresses; Scanning electron microscopy; Surface morphology; Titanium compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on

Conference_Location

Nara

ISSN

1099-4734

Print_ISBN

978-1-4244-1334-8

Electronic_ISBN

1099-4734

Type

conf

DOI

10.1109/ISAF.2007.4393174

Filename

4393174