DocumentCode :
2275941
Title :
Defect inspection challenges and solutions for ultra-thin SOI
Author :
Brun, Roland ; Moulin, Cecile ; Schwarzenbach, Walter ; Bast, Gerhard ; Aristov, Victor ; Belyaev, Alexander
Author_Institution :
Defectivity Eng. Group, SOITEC, Bernin, France
fYear :
2012
fDate :
15-17 May 2012
Firstpage :
67
Lastpage :
71
Abstract :
This paper will explain the challenges and solutions for ultra thin SOI inspection using a laser light scattering based system. The impact of reflectivity on haze, sizing and minimum threshold will be detailed. We will show how the required sensitivity for 28nm (and beyond node) SOI inspection was achieved using a commercially available unpatterned DUV inspection system. We will also study improvements in defect classification.
Keywords :
inspection; light scattering; silicon-on-insulator; defect classification; defect inspection; laser light scattering; ultra-thin SOI; unpatterned DUV inspection system; Apertures; Films; Inspection; Reflectivity; Sensitivity; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-4673-0350-7
Type :
conf
DOI :
10.1109/ASMC.2012.6212870
Filename :
6212870
Link To Document :
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