Epitaxial growth of Pt and Ir thin films on a SrTiO3(001) substrate

Author

Fujisawa, Hironori ; Kume, Masayoshi ; Shimizu, Masaru ; Kotaka, Yasutoshi ; Honda, Koichiro

Author_Institution

Univ. of Hyogo, Hyogo

fYear

2007

fDate

27-31 May 2007

Firstpage

183

Lastpage

185

Abstract

We investigated epitaxial growth of Pt and Ir thin films on SrTO₃(001) (STO)(100) single crystal by rf-sputtering. When Pt and Ir were directly deposited on STO(IOO), coherently grown Pt and Ir films with an atomically flat surface cannot be obtained due to the generation of misfit dislocations. On the other hand, when 0.5 nm-thick Ir layer was inserted into the interface between Pt films and STO, the generation of misfit dislocations at the interface was drastically reduced and coherently grown Pt films with an atomic step and terrace structure were successfully obtained on STO substrate.

Keywords

X-ray diffraction; atomic force microscopy; dislocations; epitaxial layers; iridium; lattice constants; metallic thin films; platinum; sputter deposition; strontium compounds; surface structure; transmission electron microscopy; AFM; Ir; Pt; SrTiO₃; TEM; XRD; atomically flat surface; epitaxial growth; epitaxial thin films; lattice parameters; misfit dislocations; rf sputtering; size 0.5 nm; thin films; Atomic force microscopy; Atomic layer deposition; Crystallization; Electrodes; Epitaxial growth; Ferroelectric films; Ferroelectric materials; Lattices; Substrates; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on

Conference_Location

Nara

ISSN

1099-4734

Print_ISBN

978-1-4244-1334-8

Electronic_ISBN

1099-4734

Type

conf

DOI

10.1109/ISAF.2007.4393207

Filename

4393207