DocumentCode :
2276093
Title :
Sputtering Deposition of (BaxSr1-x) TiO3 Thin Films for Microwave Waveguide Devices
Author :
Kohno, T. ; Tsuchikawa, T. ; Bhakdisongkhram, G. ; Nishida, T. ; Takeda, H. ; Uchiyama, K. ; Shiosaki, T.
Author_Institution :
Nara Inst. of Sci. & Technol., Nara
fYear :
2007
fDate :
27-31 May 2007
Firstpage :
209
Lastpage :
211
Abstract :
Barium strontium titanate (BaxSr1-x)TiO3 films are expected to be utilized for microwave integrated circuit devices; therefore, the preparation of highly crystalline BST films has been investigated. In this study, we attempted to prepare (BaxSr1-x)TiO3 films on MgO and sapphire substrates by sputtering under various conditions. It was revealed that BST films could be obtained at lower substrate temperatures on sapphire substrates, and sputtering gases with low oxygen composition were preferred to improve dielectric properties.
Keywords :
barium compounds; dielectric thin films; permittivity; sputter deposition; strontium compounds; Al2O3; BaSrTiO3; dielectric constant; dielectric properties; microwave integrated circuit devices;; microwave waveguide devices; sapphire substrates; sputtering deposition; thin films; Barium; Binary search trees; Crystallization; Dielectric substrates; Microwave devices; Microwave integrated circuits; Sputtering; Strontium; Temperature; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location :
Nara
ISSN :
1099-4734
Print_ISBN :
978-1-4244-1334-8
Electronic_ISBN :
1099-4734
Type :
conf
DOI :
10.1109/ISAF.2007.4393216
Filename :
4393216
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2276093
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