DocumentCode :
2276571
Title :
A comparison of data mining methods for yield modeling, chamber matching and virtual metrology applications
Author :
Sharma, D. ; Armer, H. ; Moyne, J.
Author_Institution :
Appl. Mater., Appl. Global Services, Bangalore, India
fYear :
2012
fDate :
15-17 May 2012
Firstpage :
231
Lastpage :
236
Abstract :
Statistical modeling methods have become a key tool in yield analysis and chamber matching. As the transition to 45nm and below increases it is becoming difficult to maintain yield and avoid excursions. Generalized and accurate models of process behavior to predict yield can quickly give insight into the cause of yield loss and process excursion. Here we simulate linear and nonlinear models of yield from process data and evaluate the performance of methods like partial least squares, support vector regression, and rules ensemble in predicting these yield models.
Keywords :
data mining; fault diagnosis; integrated circuit measurement; integrated circuit modelling; integrated circuit yield; least squares approximations; production engineering computing; regression analysis; chamber matching; data mining methods; nonlinear models; partial least squares; process excursion; rules ensemble; size 45 nm; statistical modeling methods; support vector regression; virtual metrology applications; yield analysis; yield loss; yield modeling; Data models; Metrology; Predictive models; Random variables; Robustness; Semiconductor device modeling; Support vector machines; partial least squares; rules ensemble; support vector regression;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-4673-0350-7
Type :
conf
DOI :
10.1109/ASMC.2012.6212896
Filename :
6212896
Link To Document :
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