A failure model of heating filaments in epitaxial growth tools

This paper presents a failure model of heating filaments as used in semiconductor manufacturing tools for growing epitaxial films. Attempts were endeavoured to provide feasible physical insights on the observations in changes of impedance as indirectly derived via readings of voltage-current measurements, instead of conventional data-driven black-box approach of statistical regressions. The proposed model is able to predict the magnitudes of these impedance changes and the classification result lends itself to the setting up of quantifiable control limits to enable early warnings of fault detections in process controls.