Comprehensive 3D simulation of laser/target interactions for various applications

Development of efficient Laser Produced Plasma (LPP) devices as photon radiation sources with specific characteristics requires optimization of many laser beam parameters, target configuration, and environmental conditions. Accurate computer simulation with sufficient details can be used with confidence to understand, design, and optimize LPP devices and save significant time and cost compared to conducting numerous expensive experiments. Our extensive well-benchmarked modeling and optimization of LPP sources for extreme ultraviolet (EUV) Lithography (EUVL) applications and for design of LPP devices showed the importance of advanced integrated models and fine- details of computational methods on overall system performance including target ablation rates, plasma hydrodynamic evolution, and photon radiation and transport. We used our state-of-the art HEIGHTS package to simulate LPP sources in full 3-D geometry using various target configurations (fragmented, mass-limited, microdroplets, etc.) to enhance photon emission and transport.We also simulated dual laser pulse system to enhance the conversion efficiency of laser to photon radiation in specific spectral range. We studied target mass dependence, laser parameters, atomic and ionic debris generation, and optimization of EUV (13.5 nm) radiation for next generation lithography with minimum debris production to protect the mirror collection system.