Title :
Generation of 10-/spl mu/J XUV light using high-order harmonics
Author :
Takahashi, E. ; Nabekawa, Y. ; Midorikawa, K.
Author_Institution :
RIKEN, Laser Technol. Lab., Saitama, Japan
Abstract :
Summary form only given. We demonstrated the generation of 10 /spl mu/J high-quality XUV light at a wavelength between 73.6 to 42.6 nm using high-order harmonics. The peak power of this coherent XUV light was estimated to be 0.13 GW at 62.3 nm.
Keywords :
X-ray optics; X-ray production; high-speed optical techniques; laser beams; optical harmonic generation; optical phase matching; ultraviolet sources; xenon; 0.13 GW; 10 muJ; 62.3 nm; 73.6 to 42.6 nm; Ti:sapphire laser system; XUV light generation; Xe; chirped pulse amplification; coherent XUV light; high-order harmonics; high-quality XUV light; long interaction cell; phase matching condition; soft X-ray; Brightness; Extraterrestrial measurements; Gas lasers; Optical harmonic generation; Photodiodes; Power harmonic filters; Pulse amplifiers; Space vector pulse width modulation; Spectroscopy; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
DOI :
10.1109/CLEO.2002.1034474
