• DocumentCode
    2277383
  • Title

    Industrial applications of cathodic-arc and RF/DC magnetron plasma

  • Author

    Eun-Hyun Bae ; Min-Suk Oh ; Jun-Hee Hong ; Jin-Woo Jun ; Jin-An Jung ; Han-Bong Kim

  • Author_Institution
    BumJin Inst. of Mater. Res., Seoul, South Korea
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    163
  • Abstract
    Summary form only given. Wear resistant, anti-corrosive and decorative thin films for industrial application were developed using cathodic-arc and magnetron plasmas. Carbonitride films using cathodic-arc plasma have been developed for wear-resistant applications-cutting tools and dies. Decorative ZrC/sub x/N/sub y/, and TiC/sub x/N/sub y/ films were developed for kitchen tools-bowls, spoons, knives and gas range´s outer covers. Anti-corrosive, decorative AlN and Ti(Zr)CN hard-coating techniques for cold-rolled steel plate were developed using cathodic arc and DC/RF magnetron plasmas. Wear resistant transparent diamond-like-carbon (DLC) film for eye glasses was developed using RF magnetron and modified cathodic-arc plasmas.
  • Keywords
    aluminium compounds; arcs (electric); carbon; cathodes; coatings; corrosion protective coatings; decorative coatings; high-frequency discharges; plasma applications; plasma deposited coatings; sputter deposition; titanium compounds; wear resistant coatings; zirconium compounds; AlN; C; RF/DC magnetron plasma; TiC/sub x/N/sub y/ films; TiCN; ZrC/sub x/N/sub y/ films; ZrCN; anti-corrosive thin films; bowls; cathodic-arc plasma; cold-rolled steel plate; cutting tools; decorative thin films; dies; eye glasses; gas range; hard-coating techniques; kitchen tools; knives; spoons; wear resistant thin films; wear-resistant applications; Geometry; Hydrogen; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sources; Plasma temperature; Radio frequency; Thermal spraying;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531624
  • Filename
    531624