Title : 
Industrial applications of cathodic-arc and RF/DC magnetron plasma
         
        
            Author : 
Eun-Hyun Bae ; Min-Suk Oh ; Jun-Hee Hong ; Jin-Woo Jun ; Jin-An Jung ; Han-Bong Kim
         
        
            Author_Institution : 
BumJin Inst. of Mater. Res., Seoul, South Korea
         
        
        
        
        
            Abstract : 
Summary form only given. Wear resistant, anti-corrosive and decorative thin films for industrial application were developed using cathodic-arc and magnetron plasmas. Carbonitride films using cathodic-arc plasma have been developed for wear-resistant applications-cutting tools and dies. Decorative ZrC/sub x/N/sub y/, and TiC/sub x/N/sub y/ films were developed for kitchen tools-bowls, spoons, knives and gas range´s outer covers. Anti-corrosive, decorative AlN and Ti(Zr)CN hard-coating techniques for cold-rolled steel plate were developed using cathodic arc and DC/RF magnetron plasmas. Wear resistant transparent diamond-like-carbon (DLC) film for eye glasses was developed using RF magnetron and modified cathodic-arc plasmas.
         
        
            Keywords : 
aluminium compounds; arcs (electric); carbon; cathodes; coatings; corrosion protective coatings; decorative coatings; high-frequency discharges; plasma applications; plasma deposited coatings; sputter deposition; titanium compounds; wear resistant coatings; zirconium compounds; AlN; C; RF/DC magnetron plasma; TiC/sub x/N/sub y/ films; TiCN; ZrC/sub x/N/sub y/ films; ZrCN; anti-corrosive thin films; bowls; cathodic-arc plasma; cold-rolled steel plate; cutting tools; decorative thin films; dies; eye glasses; gas range; hard-coating techniques; kitchen tools; knives; spoons; wear resistant thin films; wear-resistant applications; Geometry; Hydrogen; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sources; Plasma temperature; Radio frequency; Thermal spraying;
         
        
        
        
            Conference_Titel : 
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
         
        
            Conference_Location : 
Madison, WI, USA
         
        
        
            Print_ISBN : 
0-7803-2669-5
         
        
        
            DOI : 
10.1109/PLASMA.1995.531624