• DocumentCode
    2280953
  • Title

    The influence of package thermal resistance on the EMP injection damage effect of transistors

  • Author

    Xingrong, Ren ; Changchun, Chai ; Zhenyang, Ma ; Yintang, Yang ; Jing, Wang ; Lihua, Ren

  • Author_Institution
    Key Lab. of Minist. of Educ. for Wide Band-Gap Semicond. Mater. & Devices, Xidian Univ., Xi´´an, China
  • fYear
    2010
  • fDate
    16-19 Aug. 2010
  • Firstpage
    1210
  • Lastpage
    1213
  • Abstract
    With the thermal effects of substrate and package in mind, electrothermal simulations are performed on the transient response of transistors under the injection of electromagnetic pulses by adopting the 2-D device simulator ISE-TCAD. Simulation results show that the junction temperature inside a transistor will increase so instantly to the melting point of silicon within tens or hundreds of nanoseconds as to damage the device when the current mode second breakdown arises in the transistor for electromagnetic pulses with high power. In this case, the thermal resistance of package has little influence over the burnout time and damage energy. However, when the electromagnetic pulse has too small a power to produce the current mode second breakdown, the thermal mode second breakdown will arise in the transistor. In this case, the thermal resistance of package will have a notable effect over the burnout time and damage energy.
  • Keywords
    electromagnetic pulse; technology CAD (electronics); thermal management (packaging); thermal resistance; transistors; 2D device simulator; EMP injection damage; ISE-TCAD; burnout time; damage energy; electromagnetic pulses; electrothermal simulations; thermal resistance package; transient response; transistors; Current density; Electronic packaging thermal management; Substrates; Temperature distribution; Thermal resistance; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4244-8140-8
  • Type

    conf

  • DOI
    10.1109/ICEPT.2010.5582767
  • Filename
    5582767