Title :
Study of non-maxwellian electron energy distribution functions for an oxygen discharge
Author :
Toneli, David A. ; Roberto, Marisa ; Pessoa, R.S.
Author_Institution :
Technol. Inst. of Aeronaut., São José dos Campos, Brazil
Abstract :
Summary form only given. The effect of the electron energy distribution function (EEDF) on high-density, low-pressure, oxygen discharges is investigated in this work. Some examples of the oxygen discharge applications are ashing of photoresist, removing polymer films and oxidation or deposition of thin film oxides. A global model for oxygen inductively coupled plasma (ICP) [1] was modified to include a general distribution function allowing the study of the plasma parameters as the EEDF is varied from being Maxwellian to become Druyvesteyn like. Plasma parameters namely electron density, electron temperature, plasma potential and electronegativity are discussed for different values of applied power and pressure for these two types of EEDFs. Moreover, our results are compared with argon ICP [2], thus the main differences between electropositive plasma and electronegative plasma were studied. When a Druyvesteyn EEDF is assumed, the number of high-energy electrons is fewer and the number of average-energy electrons is higher compared with an assumption of a Maxwellian EEDF. The electron density and the electronegativity decrease as the EEDF change from Maxwellian to Druyvesteyn.
Keywords :
discharges (electric); electron density; electronegativity; oxidation; oxygen; plasma density; plasma simulation; plasma temperature; Druyvesteyn electron energy distribution function; O2; applied power; average-energy electrons; electron density; electron energy distribution function effect; electron temperature; electronegative plasma; electronegativity; electropositive plasma; global model; high-density low-pressure oxygen discharges; high-energy electrons; nonMaxwellian electron energy distribution functions; oxidation; oxygen inductively coupled plasma; photoresist ashing; plasma parameters; plasma potential; polymer films; thin film oxide deposition; Discharges (electric); Distribution functions; Educational institutions; Fault location; Iterative closest point algorithm; Plasmas;
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
DOI :
10.1109/PLASMA.2014.7012703