DocumentCode :
2282225
Title :
Stability of silicon microfabricated pull-in voltage references
Author :
Rocha, L.A. ; Wolffenbuttel, R.F.
Author_Institution :
Dept. for Microelectron., Delft Univ. of Technol., Netherlands
fYear :
2002
fDate :
16-21 June 2002
Firstpage :
172
Lastpage :
173
Abstract :
Micromechanical structures have been designed, fabricated in silicon and tested for use as on-chip voltage reference. Applications are in electrical metrology and in integrated silicon microsystems. Microbeams of 100 /spl mu/m length, 3 /spl mu/m width and 11 /spl mu/m thickness are electrostatically actuated with a very reproducible pull-in voltage at 9.1 V. Devices demonstrated an initial drift of -12 mV over 10 days and stabilised with a 500 /spl mu/V uncertainty. The temperature coefficient is 1.2 mV/K and the overall noise level is at 100 /spl mu/V (analytical value).
Keywords :
elemental semiconductors; measurement standards; micromechanical devices; silicon; voltage measurement; 9.1 V; Si; drift; electrical metrology; electrostatic actuation; integrated silicon microsystem; microbeam; micromechanical structure; noise level; on-chip voltage reference; pull-in voltage; silicon microfabrication; stability; temperature coefficient; uncertainty; Chemical technology; Electrodes; Electrostatics; Metrology; Micromechanical devices; Silicon; Stability; Temperature; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements, 2002. Conference Digest 2002 Conference on
Conference_Location :
Ottawa, Ontario, Canada
Print_ISBN :
0-7803-7242-5
Type :
conf
DOI :
10.1109/CPEM.2002.1034775
Filename :
1034775
Link To Document :
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