Title :
DRAM Using Crystalline Oxide Semiconductor for Access Transistors and Not Requiring Refresh for More Than Ten Days
Author :
Atsumi, Tomoaki ; Nagatsuka, Shuhei ; Inoue, Hiroki ; Onuki, Tatsuya ; Saito, Toshihiko ; Ieda, Yoshinori ; Okazaki, Yutaka ; Isobe, Atsuo ; Shionoiri, Yutaka ; Kato, Kiyoshi ; Okuda, Takashi ; Koyama, Jun ; Yamazaki, Shunpei
Author_Institution :
Semicond. Energy Lab. Co., Ltd., Atsugi, Japan
Abstract :
We fabricated a dynamic random access memory (DRAM) using crystalline oxide semiconductor (OS) transistors and not requiring refresh for more than ten days. We call this memory a dynamic oxide semiconductor random access memory (DOSRAM). A crystalline oxide semiconductor is an In-Ga-Zn-oxide (IGZO) semiconductor and has a c-axis aligned crystal (CAAC) structure. A crystalline OS transistor has extremely low off-state current. The DOSRAM uses this device for access transistors, and can have a very long refresh cycle. A memory cell array made of a crystalline OS layer can be stacked on peripheral circuits made of a silicon (Si) semiconductor layer; thus, the area of the DOSRAM can be decreased.
Keywords :
DRAM chips; II-VI semiconductors; gallium compounds; indium compounds; semiconductors; transistors; wide band gap semiconductors; zinc compounds; DRAM; InGaO3(ZnO)m; access transistor; c-axis aligned crystal structure; crystalline OS layer; crystalline OS transistor; crystalline oxide semiconductor; crystalline oxide semiconductor transistor; dynamic oxide semiconductor random access memory; low off-state current; memory cell array; peripheral circuit; silicon semiconductor layer; Arrays; Compounds; Nonvolatile memory; Random access memory; Silicon; Stacking; Transistors;
Conference_Titel :
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location :
Milan
Print_ISBN :
978-1-4673-1079-6
DOI :
10.1109/IMW.2012.6213660