DocumentCode
2283054
Title
Analysis of hybrid-mode operation of SOI MOSFETs
Author
Matloubian, Mishel
Author_Institution
Technol. Center, Hughes Aircraft Co., Carlsbad, CA, USA
fYear
1993
fDate
5-7 Oct 1993
Firstpage
107
Abstract
In this paper, the characteristics of n-channel SOI MOSFETs in MOS and hybrid-modes of operation are simulated using standard MOS I-V equations. It is shown that the enhancement in drain current in the threshold region is only due to the reduction of the MOS threshold voltage by the applied positive body bias. Only for body voltages higher than 2φP does the BJT contribution to the drain current become significant
Keywords
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; silicon; BJT; MOS I-V equations; MOS threshold voltage; body bias; drain current; hybrid-mode operation; n-channel SOI MOSFETs; simulation; Body regions; Doping; Electrons; Equations; Heterojunctions; MOSFETs; Semiconductor films; Silicon; Threshold voltage; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 1993. Proceedings., 1993 IEEE International
Conference_Location
Palm Springs, CA
Print_ISBN
0-7803-1346-1
Type
conf
DOI
10.1109/SOI.1993.344541
Filename
344541
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