Title :
Electrostatic gas valve for semiconductor manufacturing system
Author :
Sato, Kazuo ; Shikida, Mitsuhiro
Abstract :
A new type of valve, made of silicon and electrostatically driven, is investigated to the application for gas control in semiconductor manufacturing equipment. This valve aims to be built in growth chambers or be integrated in an arrayed manner on a silicon wafer, thus minimizing dead volume and providing quicker response in operation. The valve allows an adequate amount of gas flow for rarefied pressure conditions and is also applicable under high pressures of several atmospheres
Keywords :
Actuators; Conductive films; Control systems; Electrodes; Electrostatics; Fluid flow; Manufacturing systems; Silicon; Vacuum systems; Valves;
Conference_Titel :
Micro Machine and Human Science, 1994. Proceedings., 1994 5th International Symposium on
Conference_Location :
Nagoya, Japan
Print_ISBN :
0-7803-2095-6
DOI :
10.1109/ISMMHS.1994.512911
