DocumentCode
2283240
Title
Novel X-ray sensitive resists for the LiGA-technique
Author
Hautling, L. H. ; Hoessel, P. ; Hoffmann, G. ; Wuensch, T. ; Koch, Ed ; Hormers, J. ; Wollersheim, O.
fYear
1994
fDate
2-4 Oct. 1994
Firstpage
149
Abstract
Poly-L-Lactides are presented as a new resist material for the LiGA-technique, which is both, more sensitive and free of stress crack formation. The degradation mechanism of Poly-L-Lactides is found to produce carboxylic acid-as well as acrylic ester end groups. Determining the molecular weight of the fragments generated, the G-values can be calculated
Keywords
Etching; Laboratories; Lithography; Plastics; Polymers; Resists; Solvents; Stress; Synchrotrons; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Machine and Human Science, 1994. Proceedings., 1994 5th International Symposium on
Conference_Location
Nagoya, Japan
Print_ISBN
0-7803-2095-6
Type
conf
DOI
10.1109/ISMMHS.1994.512915
Filename
512915
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