DocumentCode :
2283616
Title :
A new approach to ionized-impurity scattering
Author :
Kosina, H. ; Kaiblinger-Grujin, G. ; Selberherr, S.
Author_Institution :
Inst. for Microelectron., Tech. Univ. Vienna, Austria
fYear :
1997
fDate :
8-10 Sept. 1997
Firstpage :
205
Lastpage :
208
Abstract :
The Brooks-Herring (BH) approach to ionized impurity scattering overestimates the low-field mobility of electrons in doped semiconductors. We present a consistent ionised-impurity scattering model which, in addition to the BH model, accounts for degenerate statistics, dispersive screening, two-ion scattering and the atomic form factor of the impurity atom. The dielectric function is accurately approximated by a rational function. From the Schwinger scattering amplitude a correction to the first Born amplitude is derived. The charge distribution of the impurities is described by the Thomas-Fermi theory in the energy functional formulation. Despite the various physical effects added an analytical expression for the scattering rate is retained which allows for efficient usage in Monte Carlo transport calculations. Results of such calculations are presented for majority and minority electron mobility in silicon. The results not only confirm the experimental data of the mobility enhancement of minority electrons in degenerate silicon but also the lower electron mobility in As-doped silicon in comparison to P-doped silicon.
Keywords :
Monte Carlo methods; Thomas-Fermi model; degenerate semiconductors; dielectric function; electron mobility; elemental semiconductors; impurity scattering; silicon; Brooks-Herring model; Monte Carlo transport simulation; Schwinger scattering amplitude; Si:As; Si:P; Thomas-Fermi theory; atomic form factor; charge distribution; degenerate silicon; dielectric function; dispersive screening; doped semiconductor; energy functional; first Born approximation; ionized impurity scattering; low-field electron mobility; majority electron mobility; minority electron mobility; two-ion scattering; Approximation methods; Dielectrics; Electron mobility; Microelectronics; Monte Carlo methods; Scattering; Semiconductor impurities; Semiconductor process modeling; Silicon; Statistical distributions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on
Conference_Location :
Cambridge, MA, USA
Print_ISBN :
0-7803-3775-1
Type :
conf
DOI :
10.1109/SISPAD.1997.621373
Filename :
621373
Link To Document :
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