DocumentCode :
2284716
Title :
Sheath expansion in two-dimensional Cartesian and cylindrical targets
Author :
Hong, M.P. ; Emmert
Author_Institution :
Dept. of Nucl. Eng., Wisconsin Univ., Madison, WI, USA
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
204
Lastpage :
205
Abstract :
Summary form only given, as follows. The transient sheath expansion induced by a voltage pulse applied to two-dimensional targets is simulated numerically with a fluid model. Non-linear sheath expansion due to sheath overlapping in a small cylindrical bore with a finite depth is presented. The sheath expansion inside the bore is enhanced by the initially nonuniform plasma distribution. The angular distribution of the ions impinging on the target surface and the nonuniformity of the incident ion dose are calculated for a cylindrical bore target. A dip of the dose profile, seen earlier for square targets, appears at convex corners of the target. This dip is a numerical artifact, not a real physical phenomenon, mainly caused by false diffusion (numerical diffusion) and inaccurate estimation of the electric field on the corner. By re-orientation of the numerical mesh to suppress false diffusion, the dip effect can be be eliminated effectively in the square target case.
Keywords :
numerical analysis; plasma sheaths; plasma simulation; plasma theory; angular distribution; convex corners; cylindrical bore target; cylindrical targets; dip effect; dose profile; electric field; finite depth; fluid model; incident ion dose; initially nonuniform plasma distribution; nonlinear sheath expansion; nonuniformity; numerical artifact; numerical diffusion; numerical mesh; re-orientation; small cylindrical bore; target surface; transient sheath expansion; two-dimensional Cartesian targets; two-dimensional targets; voltage pulse; Boring; Circuit simulation; Conductors; Fault location; Laboratories; Plasma immersion ion implantation; Plasma properties; Plasma sheaths; Plasma simulation; Plasma sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.531732
Filename :
531732
Link To Document :
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