DocumentCode :
2284756
Title :
Global modeling and PIC simulation of low-temperature plasma discharges
Author :
Jae Koo Lee ; Lee, H.J. ; Lee, J.H. ; Lim, Y.Y. ; Chung, T.H. ; Lee, S.H. ; Wang, M.C.
Author_Institution :
Pohang Univ. of Sci. & Technol., South Korea
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
205
Abstract :
Summary form only given, as follows. A global model which includes the time-dependent evolution of spatially averaged plasma parameters is used for studying several different types of low-temperature plasma discharges such as the pseudospark discharge and the inductively coupled plasma discharges. The pulse effect of the applied power source to plasma including secondary electron emission and recombination is extensively investigated. These characteristics are compared (whenever possible) with those from particle-in-cell simulations with Monte-Carlo collisions, which are also used for examining in detail the Paschen breakdown and self-oscillation (with period doubling) properties of a capacitively coupled discharge.
Keywords :
discharges (electric); ion recombination; plasma collision processes; plasma oscillations; plasma simulation; secondary electron emission; sparks; Monte-Carlo collisions; Paschen breakdown; applied power source; capacitively coupled discharge; electron recombination; global model; global modeling; inductively coupled plasma discharges; low-temperature plasma discharges; particle-in-cell simulations; period doubling; pseudospark discharge; pulse effect; secondary electron emission; self-oscillation; spatially averaged plasma parameters; time-dependent evolution; Electrons; Fault location; Integrated optics; Nuclear and plasma sciences; Optical pulses; Plasma properties; Plasma simulation; Plasma sources; Shape; USA Councils;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.531733
Filename :
531733
Link To Document :
بازگشت