• DocumentCode
    2284756
  • Title

    Global modeling and PIC simulation of low-temperature plasma discharges

  • Author

    Jae Koo Lee ; Lee, H.J. ; Lee, J.H. ; Lim, Y.Y. ; Chung, T.H. ; Lee, S.H. ; Wang, M.C.

  • Author_Institution
    Pohang Univ. of Sci. & Technol., South Korea
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    205
  • Abstract
    Summary form only given, as follows. A global model which includes the time-dependent evolution of spatially averaged plasma parameters is used for studying several different types of low-temperature plasma discharges such as the pseudospark discharge and the inductively coupled plasma discharges. The pulse effect of the applied power source to plasma including secondary electron emission and recombination is extensively investigated. These characteristics are compared (whenever possible) with those from particle-in-cell simulations with Monte-Carlo collisions, which are also used for examining in detail the Paschen breakdown and self-oscillation (with period doubling) properties of a capacitively coupled discharge.
  • Keywords
    discharges (electric); ion recombination; plasma collision processes; plasma oscillations; plasma simulation; secondary electron emission; sparks; Monte-Carlo collisions; Paschen breakdown; applied power source; capacitively coupled discharge; electron recombination; global model; global modeling; inductively coupled plasma discharges; low-temperature plasma discharges; particle-in-cell simulations; period doubling; pseudospark discharge; pulse effect; secondary electron emission; self-oscillation; spatially averaged plasma parameters; time-dependent evolution; Electrons; Fault location; Integrated optics; Nuclear and plasma sciences; Optical pulses; Plasma properties; Plasma simulation; Plasma sources; Shape; USA Councils;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531733
  • Filename
    531733