Title :
PDN analysis of TSV based decoupling capacitor stacked chip (DCSC) in 3D-ICs
Author :
Song, Eunseok ; Pak, Jun So ; Kim, Joungho
Author_Institution :
Dept. of Electr. Eng., KAIST, Daejeon, South Korea
Abstract :
In this paper, we introduce a new decoupling capacitor stacked chip (DCSC) with discrete capacitors and through-silicon-vias (TSVs) that can be implemented into a multi-stacked 3D-IC system. The core idea of the proposed TSV-based DCSC is stacking the decoupling capacitors such as a silicon-based NMOS capacitor and a discrete capacitor on the backside of a chip and connecting the capacitors to the chip-power distribution network (PDN) through TSVs. A new TSV based DCSC structure that has the advantages of chip-level NMOS capacitor (under several tens pH) and package-level decoupling capacitor (up to several uF) solutions, which represent the conventional decoupling capacitor solution, is proposed. The proposed DCSC is a proper structure for implementing into multi-stacked 3D-IC systems through using the TSV technology. In addition, 3D PDN impedance variations are analyzed according to the number of TSVs in a multi-stacked 3D-IC system that is applied to DCSC and its arrangement. It is possible to achieve a robust 3D PDN for the power noise by using a TSV based DCSC and by arranging power as many TSVs as possible uniformly.
Keywords :
MOS integrated circuits; capacitors; chip scale packaging; silicon; three-dimensional integrated circuits; 3D PDN impedance variation; DCSC; PDN analysis; TSV; chip-level NMOS capacitor; chip-power distribution network; decoupling capacitor stacked chip; discrete capacitor; multistacked 3D-IC system; package-level decoupling capacitor; silicon-based NMOS capacitor; through-silicon-vias; Capacitance; Capacitors; Impedance; MOS devices; System-on-a-chip; Three dimensional displays; Through-silicon vias;
Conference_Titel :
Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2011 IEEE
Conference_Location :
Hanzhou
Print_ISBN :
978-1-4673-2288-1
Electronic_ISBN :
2151-1225
DOI :
10.1109/EDAPS.2011.6213793