• DocumentCode
    2285100
  • Title

    The effects of dielectric layers on SiC based epitaxial graphene in transistor applications

  • Author

    Kim, Moonkyung ; Hwang, Jeonghyun ; Shivaraman, Shriram ; Shields, Virgil B. ; Chan, Wei Min ; Thomas, Chris ; Hao, Dong ; Lee, Jo-Won ; Tiwari, Sandip ; Spencer, Michael G.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., New York, NY, USA
  • fYear
    2010
  • fDate
    17-20 Aug. 2010
  • Firstpage
    611
  • Lastpage
    614
  • Abstract
    By characterizing the mobility of Si-face/C-face of SiC graphene before and after stacking the layer of HfO2 with a polyvinyl alcohol (PVA) treatment on the device active layer, we have explored the properties of SiC based epitaxial graphene and the effects of the dielectric film with PVA treatment. Epitaxial graphene grown on the carbon face produces a higher mobility than film grown on the silicon face. Also, the mobility, in the presence of the PVA treatment, improves after the deposition of gate dielectrics: ~20% in C-face graphene and ~100% in Si-face graphene. This is unlike the degradation normally observed with dielectric/graphene systems.
  • Keywords
    carrier mobility; dielectric thin films; epitaxial growth; epitaxial layers; graphene; hafnium compounds; transistors; C; HfO2; PVA treatment; SiC; dielectric film; dielectric layers; epitaxial graphene; gate dielectrics; mobility; polyvinyl alcohol treatment; transistor applications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
  • Conference_Location
    Seoul
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-7033-4
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2010.5697796
  • Filename
    5697796