DocumentCode
2285100
Title
The effects of dielectric layers on SiC based epitaxial graphene in transistor applications
Author
Kim, Moonkyung ; Hwang, Jeonghyun ; Shivaraman, Shriram ; Shields, Virgil B. ; Chan, Wei Min ; Thomas, Chris ; Hao, Dong ; Lee, Jo-Won ; Tiwari, Sandip ; Spencer, Michael G.
Author_Institution
Sch. of Electr. & Comput. Eng., Cornell Univ., New York, NY, USA
fYear
2010
fDate
17-20 Aug. 2010
Firstpage
611
Lastpage
614
Abstract
By characterizing the mobility of Si-face/C-face of SiC graphene before and after stacking the layer of HfO2 with a polyvinyl alcohol (PVA) treatment on the device active layer, we have explored the properties of SiC based epitaxial graphene and the effects of the dielectric film with PVA treatment. Epitaxial graphene grown on the carbon face produces a higher mobility than film grown on the silicon face. Also, the mobility, in the presence of the PVA treatment, improves after the deposition of gate dielectrics: ~20% in C-face graphene and ~100% in Si-face graphene. This is unlike the degradation normally observed with dielectric/graphene systems.
Keywords
carrier mobility; dielectric thin films; epitaxial growth; epitaxial layers; graphene; hafnium compounds; transistors; C; HfO2; PVA treatment; SiC; dielectric film; dielectric layers; epitaxial graphene; gate dielectrics; mobility; polyvinyl alcohol treatment; transistor applications;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location
Seoul
ISSN
1944-9399
Print_ISBN
978-1-4244-7033-4
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2010.5697796
Filename
5697796
Link To Document