DocumentCode
2285384
Title
Remeasurement of the (220) lattice spacing of silicon
Author
Cavagnero, G. ; Durando, G. ; Mana, G. ; Massa, E. ; Zosi, G.
Author_Institution
Ist. di Metrologia "G. Colonnetti", CNR, Torino, Italy
fYear
2002
fDate
16-21 June 2002
Firstpage
562
Lastpage
563
Abstract
A need arose for a reduction of the present relative uncertainty in the measurement of the silicon lattice spacing down to 10/sup -9/. This paper describes our advances towards this goal.
Keywords
X-ray crystallography; constants; electromagnetic wave interferometry; elemental semiconductors; lattice constants; silicon; spatial variables measurement; (220) lattice spacing; Avogadro constant determination; Si; Si crystal; Si lattice spacing; X-ray interferometry; laser interferometry; lattice parameter; measurement uncertainty; Assembly; Atomic measurements; Density measurement; Geometry; Lattices; Measurement standards; Mirrors; Shape; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements, 2002. Conference Digest 2002 Conference on
Conference_Location
Ottawa, Ontario, Canada
Print_ISBN
0-7803-7242-5
Type
conf
DOI
10.1109/CPEM.2002.1034971
Filename
1034971
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