DocumentCode :
2285466
Title :
Simple fabrication of microfluidic channel with nanoporous membrane formed by conventional physical vapor deposition
Author :
Choi, Dong-Hoon ; Lee, Byung-Kee ; Yang, Hyun-Ho ; Yoon, Jun-Bo
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
fYear :
2010
fDate :
17-20 Aug. 2010
Firstpage :
740
Lastpage :
743
Abstract :
In this paper, we first proposed that the thin film deposited by conventional physical vapor deposition can be used as a membrane for molecular filtration because of its columnar grains. The columnar grains of thin membrane were formed naturally during physical vapor deposition and offered nano-sized pores to filter molecules. A microfluidic channel integrated with the membrane was successfully fabricated, and the existence of the nanopores was proved by etching sacrificial layer under the columnar thin film. Thickness of fabricated membrane is 300nm, and the diameter of the pores in the membrane is estimated below about 10nm.
Keywords :
chromium; etching; filtration; membranes; metallic thin films; microfabrication; microfluidics; nanofabrication; nanoporous materials; nickel; sputter deposition; Cr; Ni; columnar grains; etching; microfluidic channel fabrication; molecular filtration; nanoporous membrane; nanosized pores; physical vapor deposition; thin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
ISSN :
1944-9399
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2010.5697816
Filename :
5697816
Link To Document :
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