• DocumentCode
    2285757
  • Title

    A bottom-up computational framework for first-principle all-electron calculations

  • Author

    Zhang, D. ; Polizzi, E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Massachusetts, Amherst, MA, USA
  • fYear
    2010
  • fDate
    17-20 Aug. 2010
  • Firstpage
    821
  • Lastpage
    825
  • Abstract
    In this paper, we aim to address the challenges of atomistic simulations posed by traditional ab-initio modeling approaches for electronic structure calculations. We propose to demonstrate the robustness of our real-space mesh modeling framework capable to produce well-suited and scalable problems for addressing large-scale ab-initio simulations. First-principle simulations are performed solving the Kohn-Sham self-consistent equation for all-electrons using core potential in order to preserve the locality of the potential and the linear scalability of our modeling framework. We then explore the benefits of the new FEAST eigenvalue solver for simulating arbitrary atomic nanostructures. Finally, we present simulation results for systems of atoms, molecules, and Polyparaphenylene.
  • Keywords
    SCF calculations; ab initio calculations; density functional theory; eigenvalues and eigenfunctions; electronic structure; mesh generation; nanostructured materials; polymers; FEAST eigenvalue solver; Kohn-Sham self-consistent equation; arbitrary atomic nanostructures; atomistic simulations; bottom-up computational framework; core potential; electronic structure calculations; first-principle all-electron calculations; first-principle simulations; large-scale ab-initio simulations; linear scalability; polyparaphenylene; real-space mesh modeling framework; scalable problems; traditional ab-initio modeling approaches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
  • Conference_Location
    Seoul
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4244-7033-4
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2010.5697830
  • Filename
    5697830