DocumentCode :
2285863
Title :
Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties
Author :
Morozova, N. ; Konishchev, M. ; Pustovalova, A. ; Bykova, Yu. ; Grebneva, I. ; Kuzmin, O. ; Pichugin, V.
Author_Institution :
Tomsk Polytechnic University, Tomsk, Russia
fYear :
2012
fDate :
18-21 Sept. 2012
Firstpage :
1
Lastpage :
4
Abstract :
The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM). Mechanical characteristics of obtained films which include their roughness, nano-hardness (H) and Young´s modulus (E) were studied.
Keywords :
Auger electron spectroscopy; X-ray diffraction; Young´s modulus; atomic force microscopy; hardness; sputter deposition; thin films; titanium compounds; AFM; Auger electron spectroscopy; TiNxOy; X-ray diffraction; Young´s modulus; atomic force microscopy; magnetron plasma; nanohardness; optical emission spectroscopy; physical-mechanical properties; pulsed magnetron reactive sputtering deposition; structural properties; surface chemical properties; titanium oxynitride thin films; Coatings; Discharges (electric); Films; Plasmas; Sputtering; Surface treatment; Titanium; deposition; magnetron reactive sputtering; titanium oxides and oxynitride;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Strategic Technology (IFOST), 2012 7th International Forum on
Conference_Location :
Tomsk
Print_ISBN :
978-1-4673-1772-6
Type :
conf
DOI :
10.1109/IFOST.2012.6357769
Filename :
6357769
Link To Document :
بازگشت