Title :
Schottky barrier single electron and single hole transistors
Author :
Jang, Moongyu ; Jun, Myungsim ; Zyung, Taehyoung ; Park, Youngsam ; Hyun, Younghoon
Author_Institution :
NT Res. Dept., Electron. & Telecommun. Res. Inst. (ETRI), Daejeon, South Korea
Abstract :
Schottky barrier single electron/hole transistor (SB-SET/SB-SHT) are manufactured using erbium-silicide and platinum-silicide as source and drain materials. In room temperature, the manufactured SB-SET and SB-SHT showed typical FET behavior with high drive current, 550 and -376 μA/μm, respectively. At 7 K, these devices showed SET and SHT characteristics. The measured coulomb gaps are about 170 mV for the SB-SET and 220 mV for the SB-SHT. From these, the estimated sizes of the islands are 12.5 and 9.1 nm, respectively. In SB-SET and SB-SHT, high transconductance can be easily achieved because silicided electrode eliminates parasitic resistance. Moreover SB-SET and SB-SHT can be operated as conventional FET and SET/SHT depending on the bias conditions, which is very promising for SET/FET and SHT/FET hybrid applications.
Keywords :
Schottky barriers; erbium compounds; field effect transistors; platinum compounds; ErSi; FET behavior; PtSi; SB-SET-SB-SHT; Schottky barrier single-electron-hole transistors; coulomb gaps; drain materials; erbium-silicide; platinum-silicide; silicided electrode; size 12.5 nm; size 9.1 nm;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
DOI :
10.1109/NANO.2010.5697867