A structure controlled nano-porous AR film by high boiling point of organic solvent

Author

Hyunjong Kim ; Gi Kim, Seong ; Sohn, Hyung Min ; Chai, Kyung-Hoon ; Lee, Joo-won

Author_Institution

LG Components R&D Center, Ansan, South Korea

fYear

2010

fDate

17-20 Aug. 2010

Firstpage

1156

Lastpage

1159

Abstract

The particles was prepared by one step process under the strong acidic condition, starting from tetraethoxysilane (TEOS) in the present of high boiling point of reagent. The resulting solution was applied to a soda-lime glass, followed by drying and sintering process. The crystal structure was controlled by evaporation rate of solvent, which increases a size of pore. The obtained film shows 3% increasing from bare glass by one side coating. The surface morphology was investigated by scanning electron microscopy (SEM). The sintered film shows high scratch resistance against pencil scratch and strong adhesion to substrate.

Keywords

adhesion; boiling point; crystal structure; drying; evaporation; nanoporous materials; scanning electron microscopy; silicon compounds; sintering; sol-gel processing; surface morphology; thin films; SEM; SiO₂; acidic condition; adhesion; crystal structure; drying; high boiling point; nanoporous AR film; organic solvent; pencil scratch; pore size; scanning electron microscopy; scratch resistance; sintering; soda-lime glass; solvent evaporation rate; surface morphology; tetraethoxysilane;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on

Conference_Location

Seoul

ISSN

1944-9399

Print_ISBN

978-1-4244-7033-4

Electronic_ISBN

1944-9399

Type

conf

DOI

10.1109/NANO.2010.5697878

Filename

5697878