• DocumentCode
    2287358
  • Title

    Grid size independent model of inversion layer carrier mobility

  • Author

    Enda, T. ; Shigyo, N.

  • Author_Institution
    ULSI Device Eng. Lab., Toshiba Corp., Yokohama, Japan
  • fYear
    1997
  • fDate
    8-10 Sept. 1997
  • Firstpage
    319
  • Lastpage
    321
  • Abstract
    The universality of effective carrier mobility in MOSFET inversion layers has been reported. In order to realize the accurate device simulation of MOSFETs, a mobility model considering the universality is indispensable. A local field model (LFM) has been proposed. The LFM proposed was derived from the requirement that the calculated conductance of a whole inversion layer gave the measured value. However, the resulting conductance varies with the grid size strongly. The authors intend to solve this inconsistency, to examine this grid size dependency and propose a new grid size independent LFM.
  • Keywords
    MOSFET; carrier mobility; inversion layers; semiconductor device models; MOSFET; carrier mobility; device simulation; grid size independent model; inversion layer; local field model; Charge carrier density; Computational modeling; Equations; Grid computing; Laboratories; Mesh generation; Microelectronics; Performance analysis; Solid modeling; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on
  • Conference_Location
    Cambridge, MA, USA
  • Print_ISBN
    0-7803-3775-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.1997.621402
  • Filename
    621402