DocumentCode :
2289023
Title :
Energy band gap and transport mechanism of silsesquioxane LB film containing dendric core
Author :
Sung, Gi-Chan ; Lee, Ji-Yoon ; Gyong-Chol Kim ; Kang, Hyen-Wook ; Kim, Chungkyun ; Kwon, Young-Soo
Author_Institution :
Dept. of Electr. Eng. & NTRC, Dong-A Univ., Busan, South Korea
fYear :
2010
fDate :
17-20 Aug. 2010
Firstpage :
966
Lastpage :
969
Abstract :
We have used hybrid material between dendritic core and phenyl group containing silsesquioxane (G1-3Ph). Electrical properties and charge transport mechanism of G1-3Ph was investigated. G1-3Ph monolayer was achieved by the Langmuir-Blodgett (LB) method. The phase transition was investigated by π-A isotherm of G1-3Ph repeatedly five-cycles at the air-water interface. The monolayer was deposited onto highly oriented pyrolytic graphite (HOPG) substrates via Y-type deposition at surface pressure 5.5 mN/m. We measured morphologies and the I-V curve of G1-3Ph LB film using scanning tunneling microscopy (STM). The conductivity from 100 to 250 mV is about 3.32 x10-15, 4.55 × 10-14, 1.86 × 10-13, 2.27 × 10-13 S/cm, respectively. Schottky barrier is about 1.106, 1.063, 1.025 and 1.015 eV, respectively. From the result, G1-3Ph was shown an insulating property. Fowler-Nordheim plot of G1-3Ph by I-V curves investigated transport mechanism of charge. We obtained the dominant tunneling in high-voltage region by Fowler-Nordheim plot.
Keywords :
Langmuir-Blodgett films; Schottky barriers; dendrites; electrical conductivity; energy gap; monolayers; organic compounds; scanning tunnelling microscopy; π-A isotherm; Fowler-Nordheim plot; Gl-3Ph monolayer; I-V curve; Langmuir-Blodgett method; Schottky barrier; Y-type deposition; air-water interface; charge transport mechanism; dendritic core; electrical conductivity; energy band gap; highly oriented pyrolytic graphite substrates; hybrid material; phase transition; phenyl group; scanning tunneling microscopy; silsesquioxane; silsesquioxane LB film; surface pressure; tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
ISSN :
1944-9399
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2010.5698000
Filename :
5698000
Link To Document :
بازگشت